The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 22, 2024
Filed:
Sep. 03, 2021
Apple Inc., Cupertino, CA (US);
Daryl I. Vulis, San Francisco, CA (US);
Brandon J. Hui, Cupertino, CA (US);
Christian Ocier, Cupertino, CA (US);
Shang Wang, Cupertino, CA (US);
Tong Chen, Fremont, CA (US);
Zhenbin Ge, San Jose, CA (US);
Runyu Zhang, Urbana, IL (US);
Apple Inc., Cupertino, CA (US);
Abstract
Configurations for a beam deflector metasurface are disclosed. The beam deflector metasurface may include beam deflectors arranged in a repeating, radial pattern of concentric zones. The beam deflector metasurface may be a large area, high numerical aperture metasurface optic with high efficiency when directing light at non-normal angles of incidence. The different concentric zones may direct received light in varying directions with various steepness of angles. The beam deflectors may include pillars that may be the same or different width, height, or shape. The pillars may function as diffractive gratings and the cross-coupling between the pillars may direct the output light. The zones of the beam deflector metasurface may allow for diffusing hot spots and spreading the light evenly over the target area. The beam deflector metasurface may be used for non-imaging applications where the deterioration of focus allows for better efficiency at non-normal input and output angles of incidence. The beam deflectors may be designed for polarization and wavelength sensitivity as well as allowing for multiple processing benefits such as patterning the beam deflectors onto active devices.