The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 22, 2024
Filed:
Nov. 23, 2021
Fujifilm Corporation, Tokyo, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
A method for producing a radiation-sensitive resin composition includes a step 1 of putting at least a resin having a polarity that increases by an action of an acid, a photoacid generator, and a solvent into a stirring tank, and a step 2 of producing a radiation-sensitive resin composition by stirring and mixing the resin having a polarity that increases by the action of an acid, the photoacid generator, and the solvent in the stirring tank under a gas having an inert gas concentration of 90% by volume or more, in which in the step 2, an atmospheric pressure inside the stirring tank is higher than an atmospheric pressure outside the stirring tank, and in the step 2, a difference between the atmospheric pressure inside the stirring tank and the atmospheric pressure outside the stirring tank is 2.0 kPa or less.