The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 22, 2024

Filed:

Jul. 24, 2023
Applicant:

Schott Pharma Schweiz Ag, St. Gallen, CH;

Inventors:

Christian Komann, Speicher, CH;

Arne Kloke, St. Gallen, CH;

Anil Kumar Busimi, St. Gallen, CH;

Assignee:

SCHOTT Pharma Schweiz AG, St. Gallen, CH;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B65D 71/70 (2006.01); A61J 1/16 (2023.01); A61J 7/00 (2006.01); A61M 5/00 (2006.01); B01L 3/00 (2006.01); B01L 9/06 (2006.01); B65D 1/36 (2006.01); B65D 25/10 (2006.01);
U.S. Cl.
CPC ...
B65D 71/70 (2013.01); A61J 1/16 (2013.01); A61J 7/0069 (2013.01); A61M 5/008 (2013.01); B01L 3/50855 (2013.01); B01L 9/06 (2013.01); B65D 1/36 (2013.01); B65D 25/108 (2013.01); B01L 2200/021 (2013.01); B01L 2200/025 (2013.01);
Abstract

A holding structure includes receptacles formed by peripherally formed side walls, an annular gap being formed between a side wall of a container or device and one of the peripherally formed side walls when containers or devices are received therein, the receptacles being compressed in a first direction and expanded in a second direction transversely thereto, with the result that the gap is widened to form a widened clearance for handling containers or devices which are received in the receptacles, the holding structure further including an upper side, the peripherally formed side walls including an upper edge which forms a closed, smooth curve having at least one local maximum and at least one local minimum in a direction perpendicular to the upper side of the holding structure, the at least one local minimum being situated in a region of the widened clearance that is respectively assigned.


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