The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 22, 2024
Filed:
Oct. 22, 2020
Applicant:
SK Enpulse Co., Ltd., Gyeonggi-do, KR;
Inventors:
Jong Wook Yun, Gyeonggi-do, KR;
Jang Won Seo, Gyeonggi-do, KR;
Hyeyoung Heo, Gyeonggi-do, KR;
Eun Sun Joeng, Gyeonggi-do, KR;
Assignee:
SK ENPULSE CO., LTD., Gyeonggi-do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G 18/10 (2006.01); B24B 37/22 (2012.01); B24B 37/24 (2012.01); B24B 37/26 (2012.01); C08G 18/32 (2006.01); C08G 18/72 (2006.01); C08K 5/12 (2006.01); C08K 5/18 (2006.01);
U.S. Cl.
CPC ...
B24B 37/24 (2013.01); B24B 37/22 (2013.01); B24B 37/26 (2013.01); C08G 18/10 (2013.01); C08G 18/72 (2013.01); C08G 18/3203 (2013.01); C08K 5/12 (2013.01); C08K 5/18 (2013.01);
Abstract
The composition according to an embodiment employs a mixture of curing agents, which comprises a first curing agent containing sulfur and a second curing agent containing an ester group, whereby it is possible to control the physical properties of the polishing pad as necessary.