The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 15, 2024

Filed:

Jul. 14, 2021
Applicant:

Shanghai Tianma Micro-electronics Co., Ltd., Shanghai, CN;

Inventors:

Zhenyu Jia, Shanghai, CN;

Kerui Xi, Shanghai, CN;

Zhen Liu, Shanghai, CN;

Baiquan Lin, Shanghai, CN;

Dengming Lei, Shanghai, CN;

Feng Qin, Shanghai, CN;

Jing Wang, Shenzhen, CN;

Liping Zhang, Shenzhen, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01Q 3/26 (2006.01); H01P 1/18 (2006.01); H01Q 3/36 (2006.01); H01Q 15/14 (2006.01);
U.S. Cl.
CPC ...
H01Q 3/2676 (2013.01); H01P 1/182 (2013.01); H01P 1/184 (2013.01); H01Q 3/36 (2013.01); H01Q 15/147 (2013.01); H01Q 15/148 (2013.01);
Abstract

Provided are a phase shifter, a preparation method thereof, and an antenna. The phase shifter includes at least one phase shifting unit, and the phase shifting unit includes a microstrip line, a photo-dielectric layer, a ground electrode, and at least one light guiding structure; the microstrip line is located on a side of the photo-dielectric layer, and the ground electrode is located on a side of the photo-dielectric layer facing away from the microstrip line; the light-guiding structure at least partially overlaps the photo-dielectric layer, and the light-guiding structure is configured to guide light into the photo-dielectric layer.


Find Patent Forward Citations

Loading…