The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 15, 2024

Filed:

Mar. 29, 2019
Applicant:

Osaka Gas Co., Ltd., Osaka, JP;

Inventors:

Mitsuaki Echigo, Osaka, JP;

Hisao Ohnishi, Osaka, JP;

Kazuyuki Minami, Osaka, JP;

Yuji Tsuda, Osaka, JP;

Kyohei Manabe, Osaka, JP;

Osamu Yamazaki, Osaka, JP;

Assignee:

Osaka Gas Co., Ltd., Osaka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01M 8/1226 (2016.01); H01M 8/04014 (2016.01); H01M 8/0612 (2016.01);
U.S. Cl.
CPC ...
H01M 8/1226 (2013.01); H01M 8/04014 (2013.01); H01M 8/0612 (2013.01);
Abstract

A metal support for an electrochemical element has a plate shape as a whole, and is provided with a plurality of penetration spacesthat pass through the metal support from a front faceto a back face. The front faceis a face to be provided with an electrode layer. A region of the front faceprovided with the penetration spaces is a hole region, and openings of the penetration spaces formed in the front face are front-side openings. An aperture ratio that is a ratio of the front-side openings to the hole region is 0.1% or more and 7.0% or less.


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