The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 15, 2024

Filed:

Mar. 27, 2019
Applicant:

Eyl Inc., Yongin-si, KR;

Inventors:

Jung Hyun Baik, Seongnam-si, KR;

Seong Joon Cho, Seongnam-si, KR;

Bu Suk Jeong, Yongin-si, KR;

Dae Hyun Nam, Seoul, KR;

Kang Won Suh, Yongin-si, KR;

Assignee:

EYL INC., Yongin-si, KR;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06F 21/36 (2013.01); G06F 3/0488 (2022.01); G06F 3/04883 (2022.01);
U.S. Cl.
CPC ...
G06F 21/36 (2013.01); G06F 3/0488 (2013.01); G06F 3/04883 (2013.01);
Abstract

A pattern authentication method for preventing a smudge and a shoulder surfing attack. The pattern authentication method includes: a pattern registration step; and a pattern authentication step, in which the pattern registration step includes: a step of receiving a pattern from a user by an input unit of a pattern authentication device; a step of matching and storing a code value corresponding to the pattern input from the user by a matching unit; and a step of generating a user KDI (Key Derivation ID) by matching the code value to a quantum random number generated by a quantum random number generator by a KDI generator.


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