The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 15, 2024
Filed:
Jun. 14, 2021
SK Innovation Co., Ltd., Seoul, KR;
SK Inc., Seoul, KR;
Cheol Woo Kim, Daejeon, KR;
Min Kyung Seon, Daejeon, KR;
Yu Na Shim, Daejeon, KR;
Jae Hoon Kwak, Yeongju-si, KR;
Young Bom Kim, Yeongju-si, KR;
Jong Ho Lee, Yeongju-si, KR;
Jin Kyung Jo, Yeongju-si, KR;
SK Innovation Co., Ltd., Seoul, KR;
SK Inc., Seoul, KR;
Abstract
An etching composition contains phosphoric acid, phosphoric anhydride, a compound represented by the following Formula 1, and a silane compound comprising at least one silicon (Si) atom, excluding the compound represented by Formula 1: wherein, in Formula 1, A is an n-valent radical, where n is an integer of 1 to 6, L is a direct bond or hydrocarbylene, Y is selected from NR, O, PRand S, where Rto Rare independently hydrogen, halogen, a substituted or unsubstituted hydrocarbyl group, or non-hydrocarbyl group, X and Z are independently selected from N, O, P and S, and Rto Rare independently an unshared electron pair, hydrogen, or a substituted or unsubstituted hydrocarbyl group.