The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 15, 2024

Filed:

Oct. 17, 2019
Applicants:

China Petroleum & Chemical Corporation, Beijing, CN;

Shanghai Research Institute of Petrochemical Technology Sinopec, Shanghai, CN;

Inventors:

Siqing Zhong, Shanghai, CN;

Jun Xu, Shanghai, CN;

Le Zhao, Shanghai, CN;

Lianghua Wu, Shanghai, CN;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B01J 8/18 (2006.01); B01J 8/00 (2006.01); B01J 8/24 (2006.01); B01J 21/08 (2006.01); B01J 23/72 (2006.01); B01J 23/94 (2006.01); B01J 35/40 (2024.01); B01J 38/06 (2006.01); C07C 209/36 (2006.01);
U.S. Cl.
CPC ...
C07C 209/36 (2013.01); B01J 8/0055 (2013.01); B01J 8/1809 (2013.01); B01J 8/1827 (2013.01); B01J 8/24 (2013.01); B01J 21/08 (2013.01); B01J 23/72 (2013.01); B01J 23/94 (2013.01); B01J 35/40 (2024.01); B01J 38/06 (2013.01); B01J 2208/00752 (2013.01);
Abstract

A gas replacement process and a gas replacement apparatus are employed, in the nitro compound hydrogenation reaction process. The gas replacement process at least includes a first step of subjecting a stream to be replaced to the gas replacement in presence of a first replacement gas, and then a second step of subjecting to the gas replacement in presence of the second replacement gas. Assuming the superficial velocity of the first replacement gas is V1, and the superficial velocity of the second replacement gas is V2, then V2/V1≥1.5.


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