The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 15, 2024

Filed:

Jun. 21, 2019
Applicant:

Eos Gmbh Electro Optical Systems, Krailling, DE;

Inventors:

Franz-Josef Kerl, Kumhausen, DE;

Sebastian Mehl, Puchheim, DE;

Alexander Schilling, Wildpoldsried, DE;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B33Y 10/00 (2015.01); B22F 10/28 (2021.01); B22F 10/32 (2021.01); B22F 10/322 (2021.01); B22F 12/41 (2021.01); B22F 12/44 (2021.01); B22F 12/49 (2021.01); B22F 12/70 (2021.01); B29C 64/153 (2017.01); B33Y 30/00 (2015.01); B33Y 40/00 (2020.01); B22F 12/00 (2021.01);
U.S. Cl.
CPC ...
B29C 64/153 (2017.08); B22F 10/28 (2021.01); B22F 10/32 (2021.01); B22F 10/322 (2021.01); B22F 12/41 (2021.01); B22F 12/70 (2021.01); B33Y 10/00 (2014.12); B33Y 30/00 (2014.12); B33Y 40/00 (2014.12); B22F 12/224 (2021.01); B22F 12/44 (2021.01); B22F 12/49 (2021.01);
Abstract

A flow device serves for a 3D printer. The device includes a gas conveying device for generating a gas stream and a process chamber with a build area for building the object. The process chamber includes a first gas inlet for introducing a gas stream into the process chamber, and a first gas outlet and a second gas outlet for discharging the gas stream. The first gas outlet is arranged closer to the build area than the second gas outlet in a direction perpendicular to the build area, and the first gas outlet is provided substantially within a lower third of a distance of the build area from a process chamber ceiling a first height range of the process chamber with respect to its extension in a direction perpendicular to the build area and the second gas outlet is provided substantially within the upper four fifths of the distance of the build area from the process chamber ceiling.


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