The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 08, 2024

Filed:

Oct. 19, 2020
Applicant:

Boe Technology Group Co., Ltd., Beijing, CN;

Inventors:

Yang Yue, Beijing, CN;

Shi Shu, Beijing, CN;

Qi Yao, Beijing, CN;

Wei Huang, Beijing, CN;

Haitao Huang, Beijing, CN;

Shipei Li, Beijing, CN;

Yong Yu, Beijing, CN;

Xiang Li, Beijing, CN;

Chuanxiang Xu, Beijing, CN;

Wenqu Liu, Beijing, CN;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10K 59/122 (2023.01); G02B 5/20 (2006.01);
U.S. Cl.
CPC ...
H10K 59/122 (2023.02); G02B 5/201 (2013.01);
Abstract

A counter substrate is provided. The counter substrate includes a bank layer on a base substrate and defining a plurality of bank apertures; a quantum dots material layer on the base substrate, the quantum dots material layer including a plurality of quantum dots blocks respectively in at least some of the plurality of bank apertures; and a support layer on a side of the quantum dots material layer and the bank layer away from the base substrate. The support layer includes one or more support portions, orthographic projections of which on the base substrate adjacent to a periphery of an orthographic projection of a respective one of the plurality of bank apertures on the base substrate. An orthographic projection of the bank layer on the base substrate at least partially overlaps with an orthographic projection of the support layer on the base substrate.


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