The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 08, 2024

Filed:

Oct. 08, 2020
Applicant:

Safran, Paris, FR;

Inventors:

Amar Saboundji, Moissy-Cramayel, FR;

Fabrice Crabos, Moissy-Cramayel, FR;

Assignee:

SAFRAN, Paris, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/02 (2006.01); B32B 15/01 (2006.01); C22C 19/05 (2006.01); C23C 14/16 (2006.01);
U.S. Cl.
CPC ...
C23C 14/021 (2013.01); B32B 15/01 (2013.01); C22C 19/058 (2013.01); C23C 14/16 (2013.01); B32B 2311/22 (2013.01); B32B 2605/18 (2013.01);
Abstract

The present invention relates to a method for manufacturing a part, comprising the steps of chemically etching, in a wet acid medium, at least a portion of a surface of a substrate made of a monocrystalline superalloy, comprising at least one element chosen from rhenium and ruthenium, the substrate having a γ-γ' phase, the substrate having an average mass fraction of rhenium and/or ruthenium greater than or equal to 3%, the chemical etching being done in such a way that the average mass fraction of rhenium and/or ruthenium over the portion of the surface of the substance is less than 2%, and a step of depositing on the portion of the substrate a protective coating having a γ-γ′ phase and an average mass fraction of rhenium and/or ruthenium of less than 1%.


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