The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 08, 2024
Filed:
Dec. 29, 2022
Applicant:
Oerlikon Surface Solutions Ag, Pfäffikon, Pfäffikon, CH;
Inventors:
Denis Kurapov, Walenstadt, CH;
Siegfried Krassnitzer, Feldkirch, AT;
Assignee:
Oerlikon Surface Solutions AG, Pfaffikon, Pfaffikon, CH;
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/00 (2006.01); C23C 14/02 (2006.01); C23C 14/06 (2006.01); C23C 14/34 (2006.01); C23C 14/35 (2006.01); H01J 37/34 (2006.01);
U.S. Cl.
CPC ...
C23C 14/0057 (2013.01); C23C 14/024 (2013.01); C23C 14/0664 (2013.01); C23C 14/345 (2013.01); C23C 14/3485 (2013.01); C23C 14/352 (2013.01); H01J 37/3426 (2013.01); H01J 37/3467 (2013.01);
Abstract
A method for applying a coating having at least one TiCN layer to a surface of a substrate to be coated by means of high power impulse magnetron sputtering (HIPIMS), wherein, to deposit the at least one TiCN layer, at least one Ti target is used as the Ti source for producing the TiCN layer, said target being sputtered in a reactive atmosphere by means of a HIPIMS process in a coating chamber, wherein the reactive atmosphere comprises at least one inert gas, preferably argon, and at least nitrogen gas as the reactive gas, wherein: