The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 08, 2024

Filed:

Jun. 06, 2019
Applicant:

Knauf Gips KG, Iphofen, DE;

Inventor:

Rolf Hueller, Volkach, DE;

Assignee:

KNAUF GIPS KG, Iphofen, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C10L 3/10 (2006.01); B01D 53/14 (2006.01); B01D 53/18 (2006.01); B01D 53/50 (2006.01); B01D 53/80 (2006.01); C01B 17/04 (2006.01); C01F 11/46 (2006.01); F02C 3/30 (2006.01);
U.S. Cl.
CPC ...
C10L 3/103 (2013.01); B01D 53/1462 (2013.01); B01D 53/18 (2013.01); B01D 53/501 (2013.01); B01D 53/80 (2013.01); C01B 17/0404 (2013.01); C01F 11/464 (2013.01); F02C 3/30 (2013.01); B01D 2251/404 (2013.01); B01D 2251/604 (2013.01); B01D 2252/204 (2013.01); B01D 2257/302 (2013.01); B01D 2257/304 (2013.01); B01D 2257/504 (2013.01); C10L 2290/541 (2013.01); F05D 2220/31 (2013.01); F05D 2220/32 (2013.01); F05D 2220/76 (2013.01);
Abstract

A device includes a desulfurization system which forms a hydrogen sulfide-containing acid gas; a system for extracting elemental sulfur and a hydrogen sulfide-containing tail gas as exhaust gas; a device for generating electricity and gypsum from the tail gas; and a gas line system for supplying acid gas from the desulfurization system to the system for extracting elemental sulfur and to the device for generating electricity and gypsum, and for supplying tail gas from the system for extracting elemental sulfur to the device for generating electricity and gypsum. The gas line system has a gas distributing apparatus which supplies acid gas solely to the system in a first position, supplies acid gas solely to the device in a second position, and supplies a first part of the acid gas to the system and a second part of the acid gas to the device in a distributing position.


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