The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 01, 2024

Filed:

Mar. 09, 2022
Applicants:

Kabushiki Kaisha Toshiba, Tokyo, JP;

Toshiba Electronic Devices & Storage Corporation, Tokyo, JP;

Inventors:

Hiroshi Kono, Himeji Hyogo, JP;

Teruyuki Ohashi, Kawasaki Kanagawa, JP;

Takahiro Ogata, Himeji Hyogo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/16 (2006.01); H01L 29/08 (2006.01); H01L 29/10 (2006.01); H01L 29/78 (2006.01);
U.S. Cl.
CPC ...
H01L 29/1608 (2013.01); H01L 29/0878 (2013.01); H01L 29/1095 (2013.01); H01L 29/7802 (2013.01);
Abstract

A semiconductor device of embodiments includes: a first electrode; a second electrode; a gate electrode extending in a first direction; and a SiC layer. The SiC layer includes: a first conductive type first SiC region having a first region, a second region facing the gate electrode, and a third region in contact with the first electrode; a second conductive type second SiC region between the second region and the third region; a second conductive type third SiC region, the second region interposed between the second SiC region and the third SiC region; a second conductive type fourth SiC region, the third region interposed between the second SiC region and the fourth SiC region; a first conductive type fifth SiC region; a second conductive type sixth SiC region between the first region and the second SiC region; and a second conductive type seventh SiC region between the first region and the second SiC region and distant from the sixth SiC region in the first direction.


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