The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 01, 2024
Filed:
Jul. 12, 2018
Beijing Naura Microelectronics Equipment Co., Ltd., Beijing, CN;
Jinrong Zhao, Beijing, CN;
Kai Chang, Beijing, CN;
BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD., Beijing, CN;
Abstract
The present disclosure provides a liner, a reaction chamber, and a semiconductor processing device. The liner is disposed in the reaction chamber and includes a liner body being arranged around an inner side wall of the reaction chamber and is grounded; a first separator being arranged to surround a periphery of a base disposed in the reaction chamber, a lower end of the first separator being grounded through the base; a dielectric ring being arranged between an inner peripheral wall of the first separator and an outer peripheral wall of the base; and a second separator being arranged to be around a lower end of the liner body and an outer peripheral wall of the first separator. The liner provided in the present disclosure can prevent the system from generating resonance, thereby enhancing the process stability.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile