The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 01, 2024

Filed:

Dec. 23, 2021
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Frank Sinclair, Hartland, ME (US);

Klaus Becker, Kensington, NH (US);

Joseph C. Olson, Beverly, MA (US);

Tseh-Jen Hsieh, Rowley, MA (US);

Morgan Patrick Dehnel, Nelson, CA;

Anand Mathai George, Kerala, IN;

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 27/18 (2006.01); H01J 27/02 (2006.01);
U.S. Cl.
CPC ...
H01J 27/028 (2013.01); H01J 27/18 (2013.01);
Abstract

An apparatus may include a cyclotron to receive an ion beam as an incident ion beam at an initial energy, and output the ion beam as an accelerated ion beam at an accelerated ion energy. The apparatus may further include an RF source to output an RF power signal to the cyclotron chamber, the RF power source comprising a variable power amplifier, and a movable stripper, translatable to intercept the ion beam within the cyclotron at a continuum of different positions.


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