The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 01, 2024

Filed:

Jul. 30, 2019
Applicant:

Indian Institute of Science, Bangalore, IN;

Inventors:

Anirudh Katti, Bangalore, IN;

Shanthanu Chakravarthy, Bangalore, IN;

Gondi Kondaiah Ananthasuresh, Bangalore, IN;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G09B 23/28 (2006.01); A61B 1/00 (2006.01); G09B 9/00 (2006.01);
U.S. Cl.
CPC ...
G09B 23/285 (2013.01); A61B 1/00131 (2013.01); G09B 9/00 (2013.01);
Abstract

The present disclosure discloses a compliant mechanism () for application of radial resistance on a simulation endoscope (). The mechanism () comprises a support plate (), a ring member () rotatably mounted on the support plate () and a plurality of flexible beam assemblies () configured in an inner circumference of the ring member (). The plurality of flexible beam assemblies () comprises a first beam () connectable to the ring member () and a second beam () connectable to the support plate (), the circular motion of at least one of the support plate () and the ring member (), relative to each other, moves the plurality of flexible beam assemblies () radially inward and radially outward to selectively apply radial resistance on the simulation endoscope (). The complaint mechanism () of present disclosure are joint less mechanisms which are free from backlash and friction in joints.


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