The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 01, 2024
Filed:
Oct. 05, 2021
Canon Kabushiki Kaisha, Tokyo, JP;
Teresa Perez Estrada, Pflugerville, TX (US);
Timothy Brian Stachowiak, Austin, TX (US);
CANON KABUSHIKI KAISHA, Tokyo, JP;
Abstract
A method of forming a photo-cured layer on a substrate can include applying a first photocurable composition overlying a first region of the substrate and a second photocurable composition overlying a second region of the substrate and photo-curing the applied compositions, wherein the first region is a center region of the substrate and the second region is an edge region of the substrate, and the second photocurable composition has a higher vapor pressure than the first photocurable composition. The method can have the advantage that the forming of an extrusion within the edge region of the photo-cured layer can be avoided or being kept very low.