The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 01, 2024

Filed:

Feb. 10, 2022
Applicant:

Clo Virtual Fashion Inc., Seoul, KR;

Inventor:

Seung Woo Oh, Seoul, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A41H 3/00 (2006.01); G06F 30/20 (2020.01); G06F 113/12 (2020.01);
U.S. Cl.
CPC ...
A41H 3/007 (2013.01); G06F 30/20 (2020.01); G06F 2113/12 (2020.01);
Abstract

According to an example embodiment, a method and an apparatus for simulating a garment may receive, through a user interface expressing a three-dimensional (3D) garment, an input of deforming at least one style line among a plurality of style lines representing a style of the 3D garment, identify a first line corresponding to the style line among a plurality of lines included in a two-dimensional (2D) pattern corresponding to the 3D garment, deform the first line based on the input, deform the 2D pattern by propagating deformation of the first line to candidate lines associated with the first line, and output at least one of the deformed 2D pattern and the 3D garment in which the style line is deformed based on the deformed 2D pattern.


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