The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 24, 2024
Filed:
Dec. 06, 2021
Applicant:
International Business Machines Corporation, Armonk, NY (US);
Inventor:
Effendi Leobandung, Stormville, NY (US);
Assignee:
INTERNATIONAL BUSINESS MACHINES CORPORATION, Armonk, NY (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H10B 41/27 (2023.01); H01L 21/308 (2006.01); H01L 29/423 (2006.01); H01L 29/51 (2006.01); H10B 41/35 (2023.01); H10B 43/27 (2023.01); H10B 43/35 (2023.01);
U.S. Cl.
CPC ...
H10B 41/27 (2023.02); H01L 21/3086 (2013.01); H01L 29/42324 (2013.01); H01L 29/4234 (2013.01); H01L 29/517 (2013.01); H10B 41/35 (2023.02); H10B 43/27 (2023.02); H10B 43/35 (2023.02);
Abstract
Semiconductor devices and methods of forming the same include forming an etch mask on a stack of alternating dielectric layers and conductor layers. An exposed portion of a dielectric layer and a conductor layer is etched away to form a wordline. The forming and etching steps are repeated, adding additional etch mask material at each iteration, to form respective wordlines at each iteration.