The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 24, 2024

Filed:

Jan. 11, 2022
Applicant:

Rockley Photonics Limited, Altrincham, GB;

Inventor:

Guomin Yu, Glendora, CA (US);

Assignee:

Rockley Photonics Limited, Altrincham, GB;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 31/02 (2006.01); G02B 6/122 (2006.01); G02B 6/13 (2006.01); G02B 6/136 (2006.01); H01L 31/0232 (2014.01); H01L 31/028 (2006.01); H01L 31/107 (2006.01); H01L 31/18 (2006.01); G02B 6/12 (2006.01);
U.S. Cl.
CPC ...
H01L 31/02327 (2013.01); G02B 6/122 (2013.01); G02B 6/131 (2013.01); G02B 6/136 (2013.01); H01L 31/028 (2013.01); H01L 31/107 (2013.01); H01L 31/1808 (2013.01); G02B 2006/12061 (2013.01); G02B 2006/12097 (2013.01);
Abstract

A germanium based avalanche photo-diode device and method of manufacture thereof. The device including: a silicon substrate; a lower doped silicon region, positioned above the substrate; a silicon multiplication region, positioned above the lower doped silicon region; an intermediate doped silicon region, positioned above the silicon multiplication region; a doped germanium interface layer, positioned above the intermediate doped silicon region; an un-doped germanium absorption region, position above the doped germanium interface layer; an upper doped germanium region, positioned above the un-doped germanium absorption region; and an input silicon waveguide; wherein: the un-doped germanium absorption region and the upper doped germanium region form a germanium waveguide which is coupled to the input waveguide, and the device also includes a first electrode and a second electrode, and the first electrode extends laterally to contact the lower doped silicon region and the second electrode extends laterally to contact the upper doped germanium region.


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