The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 24, 2024
Filed:
Oct. 11, 2019
Leica Microsystems Cms Gmbh, Wetzlar, DE;
LEICA MICROSYSTEMS CMS GMBH, Wetzlar, DE;
Abstract
A method is useable for correcting a spherical aberration of a microscope having an objective and a cover slip or object carrier, the objective having a correction element for correcting the spherical aberration. The method includes: ascertaining, by the microscope, an index of refraction of an optical medium bordering the cover slip or object carrier and/or a thickness of the cover slip or object carrier along an optical axis of the objective, ascertaining the spherical aberration based on the index of refraction of the optical medium and/or the thickness of the cover slip or object carrier, and ascertaining, based on the spherical aberration, a positioning variable, by which the correction element is adjusted so that the spherical aberration is corrected.