The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 17, 2024

Filed:

Mar. 08, 2021
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Hee Bum Hong, Hwaseong-si, KR;

Heesung Shin, Hwaseong-si, KR;

Hojoon Lee, Yongin-si, KR;

Younghun Jung, Seoul, KR;

Chang-Min Hong, Hwaseong-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/11 (2006.01); H01L 21/02 (2006.01); H01L 21/285 (2006.01); H01L 21/8238 (2006.01); H01L 27/092 (2006.01); H01L 29/06 (2006.01); H01L 29/08 (2006.01); H01L 29/423 (2006.01); H01L 29/45 (2006.01); H01L 29/49 (2006.01); H01L 29/51 (2006.01); H01L 29/66 (2006.01); H01L 29/78 (2006.01); H01L 29/786 (2006.01); H10B 10/00 (2023.01);
U.S. Cl.
CPC ...
H10B 10/125 (2023.02); H01L 21/0259 (2013.01); H01L 21/28518 (2013.01); H01L 21/823807 (2013.01); H01L 21/823814 (2013.01); H01L 21/823821 (2013.01); H01L 21/823857 (2013.01); H01L 21/823871 (2013.01); H01L 27/0924 (2013.01); H01L 29/0665 (2013.01); H01L 29/0847 (2013.01); H01L 29/42392 (2013.01); H01L 29/45 (2013.01); H01L 29/4908 (2013.01); H01L 29/516 (2013.01); H01L 29/66545 (2013.01); H01L 29/66742 (2013.01); H01L 29/66795 (2013.01); H01L 29/6684 (2013.01); H01L 29/78391 (2014.09); H01L 29/7851 (2013.01); H01L 29/78618 (2013.01); H01L 29/78696 (2013.01);
Abstract

A semiconductor memory device includes a static random access memory (SRAM) cell that is provided on a substrate and includes a pass-gate transistor, a pull-down transistor, and a pull-up transistor. Each of the pass-gate transistor, the pull-down transistor, and the pull-up transistor includes an active fin protruding above a device isolation layer, a gate electrode on the active fin, and a gate insulating layer between the active fin and the gate electrode. The gate insulating layer of the pull-down transistor includes a first dipole element. The highest concentration of the first dipole element of the gate insulating layer of the pull-down transistor is higher than the highest concentration of the first dipole element of the gate insulating layer of the pass-gate transistor.


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