The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 17, 2024

Filed:

Aug. 02, 2021
Applicant:

Screen Holdings Co., Ltd., Kyoto, JP;

Inventors:

Keisuke Miyajima, Kyoto, JP;

Keiji Magara, Kyoto, JP;

Takashi Katayama, Kyoto, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67057 (2013.01); H01L 21/02052 (2013.01); H01L 21/67034 (2013.01);
Abstract

A substrate processing method includes step S, step S, and step S. In step S, a substrate immersed in a rinsing liquid is lifted from the rinsing liquid and the substrate is immersed in a rinsing liquid stored in a tank in a chamber while an organic solvent having a surface tension smaller than that of the rinsing liquid adheres to the substrate. In step S, the substrate is lifted from the rinsing liquid. In step S, a vapor of an organic solvent having a surface tension smaller than that of the rinsing liquid is supplied into the chamber in which the lifted substrate exists.


Find Patent Forward Citations

Miyajima, Keisuke. (2024). Substrate processing method and substrate processing apparatus (U.S. Patent No. 12094732). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12094732

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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