The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 17, 2024
Filed:
Dec. 20, 2021
Hong Fu Jin Precision Industry (Wuhan) Co., Ltd., Wuhan, CN;
Chin-Wei Yang, New Taipei, TW;
HONG FU JIN PRECISION INDUSTRY (WuHan) CO., LTD., Wuhan, CN;
Abstract
A method for recognizing masked faces includes: obtaining a face image to be recognized; detecting whether the face image to be recognized has a mask; extracting feature vectors of a whole face in the face image to be recognized when the face image to be recognized does not have a mask; comparing the feature vectors of the whole face with face images in a first database, and outputting a face recognition result; extracting feature vectors of an upper half face in the face image to be recognized when the face image to be recognized has a mask; comparing the feature vectors of the upper half face with face images in a second database, and outputting the face recognition result. The method of the present disclosure processes images of faces with and without masks, expanding application scenario of face recognition and improving the accuracy of recognition.