The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 17, 2024

Filed:

Jun. 10, 2021
Applicants:

Sony Group Corporation, Tokyo, JP;

Sony Corporation of America, New York, NY (US);

Inventor:

Cheng-Yi Liu, San Jose, CA (US);

Assignees:

SONY GROUP CORPORATION, Tokyo, JP;

SONY CORPORATION OF AMERICA, New York, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06V 20/13 (2022.01); B64C 39/02 (2023.01); G06F 18/214 (2023.01); G06V 10/25 (2022.01); B64U 101/30 (2023.01);
U.S. Cl.
CPC ...
G06V 20/13 (2022.01); B64C 39/024 (2013.01); G06F 18/214 (2023.01); G06V 10/25 (2022.01); B64U 2101/30 (2023.01);
Abstract

A method for removing extraneous content in a first plurality of images, captured at a corresponding plurality of poses and a corresponding first plurality of times, by a first drone, of a scene in which a second drone is present includes the following steps, for each of the first plurality of captured images. The first drone predicts a 3D position of the second drone at a time of capture of that image. The first drone defines, in an image plane corresponding to that captured image, a region of interest (ROI) including a projection of the predicted 3D position of the second drone at a time of capture of that image. A drone mask for the second drone is generated, and then applied to the defined ROI, to generate an output image free of extraneous content contributed by the second drone.


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