The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 17, 2024

Filed:

Nov. 22, 2023
Applicant:

Tencent America Llc, Palo Alto, CA (US);

Inventors:

Xifeng Gao, Tallahassee, FL (US);

Kui Wu, Los Angeles, CA (US);

Zherong Pan, Bellevue, WA (US);

Assignee:

TENCENT AMERICA LLC, Palo Alto, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 17/20 (2006.01); G06T 15/20 (2011.01);
U.S. Cl.
CPC ...
G06T 17/205 (2013.01); G06T 15/205 (2013.01); G06T 2210/12 (2013.01);
Abstract

In a method, a visual hull is generated based on intersections of first 3D primitives of a plurality of first silhouettes with a bounding box of a 3D model. The first silhouettes are generated by projecting the 3D model onto planes perpendicular to a number of selected view directions of the 3D model. Each of the first 3D primitives is obtained by extruding a connected loop of a respective first silhouette along a view direction of the number of selected view directions that is associated with the respective first silhouette. A carved mesh is be generated based on subtractions of second 3D primitives derived from positive parts of the 3D model to carve out redundant structures from the visual hull. The positive parts are obtained based on fitting planes that slices the 3D model. A low-poly mesh sequence is generated based on progressive simplifications of the carved mesh.


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