The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 17, 2024
Filed:
Oct. 16, 2020
Meta Platforms Technologies, Llc, Menlo Park, CA (US);
Lu Lu, Kirkland, WA (US);
Xiayu Feng, Kent, OH (US);
Mengfei Wang, Seattle, WA (US);
Hao Yu, Kent, OH (US);
Ryan Li, Woodinville, WA (US);
Yun-Han Lee, Redmond, WA (US);
Junren Wang, Redmond, WA (US);
Barry David Silverstein, Kirkland, WA (US);
META PLATFORMS TECHNOLOGIES, LLC, Menlo Park, CA (US);
Abstract
A first layer of anisotropic material extends along a first plane and includes anisotropic components being parallel to a second plane non-parallel and non-perpendicular to the first plane. The anisotropic components are arranged in cycloidal or helical patterns. The cycloidal or helical patterns define one or more Bragg planes that are non-parallel and non-perpendicular to the first plane and either substantially parallel or substantially perpendicular to the second plane.