The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 17, 2024

Filed:

Dec. 23, 2020
Applicant:

Beijing Voyager Technology Co., Ltd., Beijing, CN;

Inventors:

Sergio Fabian Almeida Loya, Mountain View, CA (US);

Youmin Wang, Mountain View, CA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01S 7/481 (2006.01); G01S 7/497 (2006.01); G01S 17/08 (2006.01); G02B 26/08 (2006.01);
U.S. Cl.
CPC ...
G01S 7/4817 (2013.01); G01S 7/497 (2013.01); G01S 17/08 (2013.01); G02B 26/0833 (2013.01);
Abstract

In one example, a light detection and ranging (LiDAR) module is provided. The LiDAR module includes a microelectromechanical system (MEMS), a substrate on which the MEMS is formed, and one or more measurement circuits. The MEMS includes an array of micro-mirror assemblies. One or more micro-mirror assemblies of the array of micro-mirror assemblies further includes a measurement structure connected to the micro-mirror, an electrical resistance of the measurement structure being variable based on a rotation angle of the micro-mirror. The one or more measurement circuits are configured to: determine the electrical resistance of the measurement structure of the one or more micro-mirror assemblies; and provide the determined electrical resistance to enable measurement of a rotation angle of the micro-mirror of the one or more micro-mirror assemblies.


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