The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 17, 2024

Filed:

Mar. 13, 2020
Applicant:

Honda Motor Co., Ltd., Tokyo, JP;

Inventors:

Chiaki Seki, Saitama, JP;

Yusuke Imai, Saitama, JP;

Atsushi Furukawa, Saitama, JP;

Yuichi Matsuo, Saitama, JP;

Naohiro Sato, Saitama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F01N 3/035 (2006.01); B01D 46/00 (2022.01); B01D 53/94 (2006.01); B01J 21/08 (2006.01); B01J 23/10 (2006.01); B01J 23/46 (2006.01); B01J 35/56 (2024.01); B01J 35/66 (2024.01); F01N 3/022 (2006.01); F01N 3/10 (2006.01); B01D 46/24 (2006.01);
U.S. Cl.
CPC ...
F01N 3/035 (2013.01); B01D 46/0027 (2013.01); B01D 53/9454 (2013.01); B01J 21/08 (2013.01); B01J 23/10 (2013.01); B01J 23/464 (2013.01); B01J 35/56 (2024.01); B01J 35/66 (2024.01); F01N 3/022 (2013.01); F01N 3/0222 (2013.01); F01N 3/101 (2013.01); B01D 46/2429 (2013.01); B01D 46/24491 (2021.08); B01D 46/24492 (2021.08); B01D 2279/30 (2013.01); F01N 2250/02 (2013.01); F01N 2330/30 (2013.01);
Abstract

Provided is an exhaust purification filter that is able to reduce pressure loss and that has high exhaust purification performance and particulate matter trapping performance. This exhaust purification filter comprises a filter substrate having a wall flow structure, and an exhaust purification catalyst supported on a partition wall of the filter substrate. The volume-based median pore diameter (D50) of the filter substrate is 18 μm or greater, the full width at half maximum of the pore distribution of the filter substrate is 7 μm to 15 μm, and the exhaust purification catalyst is supported in an unevenly distributed manner in a high-density layer in which the density of the exhaust purification catalyst is relatively high and a low-density layer in which the density of the exhaust purification catalyst is relatively low.


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