The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 17, 2024
Filed:
Dec. 21, 2018
Applicant:
Lg Chem, Ltd., Seoul, KR;
Inventors:
Hyun Taek Oh, Daejeon, KR;
Chang Hoon Sin, Daejeon, KR;
Kwang Seung Park, Daejeon, KR;
Moon Soo Park, Daejeon, KR;
Assignee:
LG Chem, Ltd., Seoul, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D 1/38 (2006.01); B05D 3/10 (2006.01); B05D 5/06 (2006.01); B05D 7/24 (2006.01); C09D 5/00 (2006.01); C09D 183/04 (2006.01); G02B 1/113 (2015.01);
U.S. Cl.
CPC ...
B05D 1/38 (2013.01); B05D 3/10 (2013.01); B05D 5/063 (2013.01); B05D 7/24 (2013.01); C09D 5/006 (2013.01); C09D 183/04 (2013.01); G02B 1/113 (2013.01); B05D 2320/00 (2013.01); B05D 2350/63 (2013.01);
Abstract
Provided is a method for preparing a silica layer, comprising bringing to gelation a precursor layer formed from a precursor composition comprising a silica precursor, an acid catalyst and a surfactant.