The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 17, 2024

Filed:

Jun. 22, 2018
Applicant:

Mayo Foundation for Medical Education and Research, Rochester, MN (US);

Inventors:

Ping Gong, Rochester, MN (US);

Pengfei Song, Champaign, IL (US);

Shigao Chen, Rochester, MN (US);

Joshua D. Trzasko, Rochester, MN (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A61B 8/08 (2006.01); G01N 29/46 (2006.01); G01S 15/89 (2006.01);
U.S. Cl.
CPC ...
A61B 8/5223 (2013.01); G01N 29/46 (2013.01); G01S 15/892 (2013.01); G01N 2291/015 (2013.01); G01N 2291/02475 (2013.01);
Abstract

Systems and methods for estimating acoustic properties in a region-of-interest in a subject or other object being imaged using a reference frequency method ('RFM') is described. Using this RFM technique, ultrasound data acquired at a given frequency are normalized by ultrasound data acquired at different frequencies (e.g., adjacent frequencies or otherwise) in order to provide estimations of the acoustic properties (e.g., attenuation coefficient, a backscatter coefficient, or both) that are independent of the ultrasound system used to acquire the underlying data. For instance, the amplitude of each frequency component can be normalized by a different frequency in the power spectrum to cancel out the system-dependent effects. Because the methods described in the present disclosure are system independent, they can be applied to any transducer geometry (e.g., linear or curved arrays) and using any beam pattern (e.g., focused or unfocused).


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