The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 17, 2024

Filed:

Feb. 10, 2022
Applicant:

Nikhil Gupta, Schaumburg, IL (US);

Inventor:

Nikhil Gupta, Schaumburg, IL (US);

Assignee:
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A45C 11/24 (2006.01); A45C 13/00 (2006.01); A45C 15/00 (2006.01);
U.S. Cl.
CPC ...
A45C 11/24 (2013.01); A45C 13/004 (2013.01); A45C 15/00 (2013.01); A45C 2200/10 (2013.01);
Abstract

A case for tailor's chalk includes: (a) a generally triangular base with a central portion, a retaining pocket along one edge thereof, said pocket opening toward the center of said triangular base and a pair of offset base hinge elements adjacent the pocket located adjacent opposed ends of said pocket along said one edge of said base; and (b) a generally triangular lid shaped and adapted to mate with the base and hinged thereto by a pair of mating offset lid hinge elements located along one edge of said generally triangular lid, said lid hinge elements being snap-fit mateable with said base hinge elements, the offset between said generally triangular base and said generally triangular lid being sufficient to define a storage cavity for the chalk in a closed position, the lid having a central portion opposing the central portion of the base in said closed position, the lid being coupled to the base so as to be rotatable with respect thereto to an open position where the lid is rotated by 180° with respect to the closed position and the chalk is accessible and wherein further the lid is rotatable with respect to the base to a work stand position where the lid is rotated by more than 270° with respect to the closed position such that the base is in an erect open position leaning at least slightly rearwardly where the chalk is accessible to a user.


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