The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 10, 2024

Filed:

Feb. 27, 2019
Applicant:

Sharp Kabushiki Kaisha, Sakai, JP;

Inventors:

Tohru Okabe, Sakai, JP;

Takeshi Yaneda, Osaka, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H10K 59/121 (2023.01); H01L 29/786 (2006.01); H10K 59/12 (2023.01); H10K 59/131 (2023.01);
U.S. Cl.
CPC ...
H10K 59/1213 (2023.02); H01L 29/7869 (2013.01); H01L 29/78696 (2013.01); H10K 59/131 (2023.02); H10K 59/1201 (2023.02);
Abstract

In a TFT layer forming step, first, a semiconductor layer on a resin substrate is formed by performing a semiconductor layer forming step, and subsequently a gate insulating film is formed to cover the semiconductor layer by performing a gate insulating film forming step, and then a first metal layer is formed by performing a first metal film deposition step, a first photo step, and a first etching step, and a second metal layer is formed by performing a second metal film deposition step, a second photo step, and a second etching step, thereby forming a gate layer in which the first metal layer and the second metal layer are layered.


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