The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 10, 2024
Filed:
Aug. 31, 2021
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Wolfgang R. Aderhold, Cupertino, CA (US);
Abhilash J. Mayur, Salinas, CA (US);
Yi Wang, Sunnyvale, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/324 (2006.01); G01J 5/34 (2022.01); G05B 13/02 (2006.01); G05D 23/19 (2006.01); G05D 23/27 (2006.01); G06N 20/00 (2019.01); H01L 21/66 (2006.01); H05B 1/02 (2006.01); F27B 17/00 (2006.01); H05B 3/00 (2006.01);
U.S. Cl.
CPC ...
G05D 23/1917 (2013.01); G01J 5/34 (2013.01); G05B 13/0265 (2013.01); G05D 23/27 (2013.01); G06N 20/00 (2019.01); H01L 22/12 (2013.01); H05B 1/0233 (2013.01); F27B 17/0025 (2013.01); H05B 3/0047 (2013.01);
Abstract
Aspects of the present disclosure relation to systems, methods, and apparatus for correcting thermal processing of substrates. In one aspect, a corrective absorption factor curve having a plurality of corrective absorption factors is generated.