The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 10, 2024
Filed:
Aug. 07, 2023
Applicant:
Lintec of America, Inc., Plano, TX (US);
Inventors:
Marcio D. Lima, Richardson, TX (US);
Takahiro Ueda, Frisco, TX (US);
Assignee:
LINTEC OF AMERICA, INC., Plano, TX (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/22 (2012.01); G03F 1/64 (2012.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G03F 1/22 (2013.01); G03F 1/64 (2013.01); G03F 7/70983 (2013.01);
Abstract
A filtration formed nanostructure pellicle film is disclosed. The filtration formed nanostructure pellicle film includes a plurality of carbon nanofibers that are intersected randomly to form an interconnected network structure in a planar orientation. The interconnected structure allows for a high minimum EUV transmission rate of at least 92%, with a thickness ranging from a lower limit of 3 nm to an upper limit of 100 nm, to allow for effective EUV lithography processing.