The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 10, 2024
Filed:
Dec. 29, 2023
Elemental Scientific, Inc., Omaha, NE (US);
Samsung Electronics Co., Ltd., Suwon-si, KR;
Myung Hwan Kim, Omaha, NE (US);
Daesung Kim, Omaha, NE (US);
Austin Schultz, Omaha, NE (US);
Cole Nardini, Omaha, NE (US);
David Diaz, Omaha, NE (US);
Kyle Uhlmeyer, Omaha, NE (US);
Daniel R. Wiederin, Omaha, NE (US);
Jaeyoung Kim, Suwon-si, KR;
Min-Soo Suh, Suwon-si, KR;
So Young Kim, Suwon-si, KR;
Sooyeon Kim, Suwon-si, KR;
Junghee Shin, Suwon-si, KR;
Suyeon Jeong, Suwon-si, KR;
Elemental Scientific, Inc., Omaha, NE (US);
Samsung Electronics Co., Ltd., Suwon-Si, KR;
Abstract
Systems and methods for analyzing ultra-low level concentration nanoparticles in semiconductor cleaning chemicals by single particle inductively coupled plasma mass spectrometry (spICP-MS) are described. In aspects, the methods described herein include determination factors that are specific to each of the chemical matrix and the type of analyte associated with the nanoparticles present in a fluid sample for both a particle baseline intensity value and a nanoparticle detection threshold.