The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 10, 2024

Filed:

Jun. 12, 2018
Applicant:

Mitsubishi Electric Corporation, Tokyo, JP;

Inventors:

Masashi Watanabe, Tokyo, JP;

Katsuyuki Kamei, Tokyo, JP;

Hiroyuki Fujibayashi, Tokyo, JP;

Takeo Sakairi, Tokyo, JP;

Ken Shimazaki, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01C 21/32 (2006.01); G06F 16/29 (2019.01); G09B 29/00 (2006.01);
U.S. Cl.
CPC ...
G01C 21/32 (2013.01); G06F 16/29 (2019.01); G09B 29/003 (2013.01);
Abstract

A map generation device is configured to determine evaluation value of each of a plurality of evaluation items that serve as indices for evaluation the reliability of the positional information of the planimetric feature. The plurality of evaluation items include any of an error amount when arrangement of composing points of the planimetric feature is approximated, a parallelism between an arrangement direction of composing points of the planimetric feature and a movement trajectory of the measuring vehicle, a distance between a position indicated by the position information of the planimetric feature and a position of the measuring vehicle when the position of the planimetric feature is measured, an absolute value of reflection intensity of a position of the planimetric feature obtained from the measurement information or a difference between a position of the planimetric feature and surrounding reflection intensity of the planimetric feature, and so on.


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