The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 10, 2024

Filed:

Aug. 12, 2021
Applicant:

Edwards Limited, Burgess Hill, GB;

Inventors:

Cainan Long, Burgess Hill, GB;

Ian David Stones, Burgess Hill, GB;

Phillip North, Burgess Hill, GB;

Clifford George Burt, Burgess Hill, GB;

Robin Hockley, Burgess Hill, GB;

Konstantinos Karoulas, Burgess Hill, GB;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
F16K 15/04 (2006.01); F16K 17/12 (2006.01); F16K 25/00 (2006.01);
U.S. Cl.
CPC ...
F16K 15/042 (2013.01); F16K 17/12 (2013.01); F16K 25/005 (2013.01); F16K 2200/204 (2021.08);
Abstract

A vacuum system non-return valve includes a baffle for extending across a flow path in the vacuum system and a valve member. The baffle has an aperture, a perimeter of the aperture has a valve seat. The valve member has a curved sealing surface configured to mate with the valve seat. The valve member and aperture are configured such that the valve member obscures the aperture and seals with the valve seat to impede a flow of fluid in a closed position and is displaceable in use to move away from the valve seat and allow a fluid flow in an open position; at least a portion of the surface of the baffle surrounding the aperture slopes towards the inlet end of the valve such that the aperture is smaller at the inlet end than it is at the outlet end.


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