The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 10, 2024
Filed:
Feb. 09, 2022
Concept Laser Gmbh, Lichtenfels, DE;
Christian Dicken, Lichtenfels, DE;
Moritz Beck, Lichtenfels, DE;
Concept Laser GmbH, Lichtenfels, DE;
Abstract
An adjustment to an irradiation parameter corresponding to a first irradiation unit and/or a second irradiation unit of an irradiation device of an additive manufacturing apparatus may be performed based at least in part on a simulation. The simulation may include simulating generation of a plurality of first calibration patterns by the first irradiation unit and a plurality of second calibration patterns by the second irradiation unit with a simulated change to the irradiation parameter of the irradiation device, and determining a calibration quality value based at least in part on position information relating to the plurality of first calibration patterns and the plurality of second calibration patterns. The calibration quality value may include an indication as to whether a calibration quality of the apparatus would be improved as a result of the adjustment to the irradiation parameter.