The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 10, 2024

Filed:

Oct. 06, 2022
Applicant:

Magic Leap, Inc., Plantation, FL (US);

Inventors:

Roy Patterson, Hutto, TX (US);

Charles Scott Carden, Austin, TX (US);

Satish Sadam, Round Rock, TX (US);

Ryan Christiansen, Austin, TX (US);

Matthew S. Shafran, Fletcher, NC (US);

Christopher John Fleckenstein, Round Rock, TX (US);

Vikramjit Singh, Pflugerville, TX (US);

Michael Nevin Miller, Austin, TX (US);

Kang Luo, Austin, TX (US);

Assignee:

Magic Leap, Inc., Plantation, FL (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C 59/04 (2006.01); B29C 43/22 (2006.01); B29C 43/28 (2006.01); B29C 43/30 (2006.01); B29C 43/34 (2006.01); B29C 43/48 (2006.01); B29C 43/50 (2006.01); B29C 43/52 (2006.01); B29C 43/58 (2006.01); B29C 51/26 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
B29C 59/04 (2013.01); B29C 43/222 (2013.01); B29C 43/28 (2013.01); B29C 43/305 (2013.01); B29C 43/34 (2013.01); B29C 43/48 (2013.01); B29C 43/50 (2013.01); B29C 43/52 (2013.01); B29C 43/58 (2013.01); B29C 51/262 (2013.01); G03F 7/0002 (2013.01); B29C 2043/3433 (2013.01);
Abstract

Systems, apparatus, and methods for double-sided imprinting are provided. An example system includes first rollers for moving a first web including a first template having a first imprinting feature, second rollers for moving a second web including a second template having a second imprinting feature, dispensers for dispensing resist, a locating system for locating reference marks on the first and second webs for aligning the first and second templates, a light source for curing the resist, such that a cured first resist has a first imprinted feature corresponding to the first imprinting feature on one side of the substrate and a cured second resist has a second imprinted feature corresponding to the second imprinting feature on the other side of the substrate, and a moving system for feeding in the substrate between the first and second templates and unloading the double-imprinted substrate from the first and second webs.


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