The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 10, 2024

Filed:

Apr. 09, 2024
Applicant:

Southwest Jiaotong University, Chengdu, CN;

Inventors:

Yi Xu, Chengdu, CN;

Chengyang Zhang, Chengdu, CN;

Siyi He, Chengdu, CN;

Hui Chen, Chengdu, CN;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B22F 9/14 (2006.01); C22C 1/02 (2006.01); C22C 14/00 (2006.01); C22F 1/18 (2006.01);
U.S. Cl.
CPC ...
B22F 9/14 (2013.01); C22C 1/02 (2013.01); C22C 14/00 (2013.01); C22F 1/183 (2013.01); B22F 2202/13 (2013.01); B22F 2301/205 (2013.01); B22F 2998/10 (2013.01); B22F 2999/00 (2013.01);
Abstract

A preparation method of Yttrium oxide dispersed and strengthened titanium alloy powders. The method includes following steps: mixing alloying elements according to alloy element ratios of: 0.1 wt % to 1.0 wt % Y, 5.5 wt % to 6.8 wt % Al, 3.5 wt % to 4.5 wt % V, Ti as balance, preparing alloy ingots by vacuum smelting process, and performing forging and rolling process; performing mechanical treatment for forged and rolled alloy ingots, to obtain alloy rods that meet size requirement of plasma rotating electrode process; preparing titanium alloy powders based on alloy rods by the plasma rotating electrode process; preparing parameters are: rotating speed of the alloy rods is 25000 r/min to 35000 r/min, a feeding speed of the alloy rods is 1.0 mm/s to 2.0 mm/s, power of the plasma gun is 60 kw to 140 kw, a temperature of the inert gas is 200° C. to 400° C., oxygen content of atomization chamber not greater than 100 ppm.


Find Patent Forward Citations

Loading…