The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 10, 2024
Filed:
Nov. 01, 2022
General Electric Company, Schenectady, NY (US);
James J. Murray, Mauldin, SC (US);
Shashwat Swami Jaiswal, Karnataka, IN;
Rajesh Kumar Venkata Gadamsetty, Karnataka, IN;
Hiteshkumar Rameshchandra Mistry, Karnataka, IN;
GE INFRASTRUCTURE TECHNOLOGY LLC, Greenville, SC (US);
Abstract
A gas manifold for single-nozzle deposition chambers comprising a base having a top surface and bottom surface defining a thickness; a primary nozzle having an inlet and outlet extending through the thickness of the base; and a secondary nozzle having an inlet extending partially through the top surface of the base and at least one channel extending a distance from a sidewall of the base having an outlet, the channel in fluid communication with the inlet of the secondary nozzle. The inlet of the primary nozzle has a hollow protrusion extending from the top surface of the base into the gas feed. The channel of the secondary nozzle includes a bend between the sidewall of the base and the outlet configured to pass between a first direct energy source and second direct energy source, the first energy source and second energy source disposed on a top wall of a chamber.