The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 10, 2024
Filed:
Feb. 21, 2020
Applicant:
Lucas Meyer Cosmetics, Massy, FR;
Inventors:
Assignee:
LUCAS MEYER COSMETICS, Massy, FR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61K 38/16 (2006.01); A61K 8/362 (2006.01); A61K 8/365 (2006.01); A61K 8/64 (2006.01); A61K 8/67 (2006.01); A61P 17/10 (2006.01); A61Q 17/00 (2006.01); A61Q 19/00 (2006.01);
U.S. Cl.
CPC ...
A61K 38/16 (2013.01); A61K 8/362 (2013.01); A61K 8/365 (2013.01); A61K 8/64 (2013.01); A61K 8/671 (2013.01); A61P 17/10 (2018.01); A61Q 17/005 (2013.01); A61K 2800/5426 (2013.01); A61K 2800/544 (2013.01);
Abstract
A method for treating acne vulgaris by administering a polylysine dendrimer or a salt thereof. Methods for the management of blemish- or acne-prone skin are also described. The polylysine dendrimer is used as an active for restoring or rebalancing skin microbiota. The polylysine dendrimer is also used as an active agent for improving or restoring the aspect and the feel of the skin to be treated.
Attia-Vigneau, Joan. (2024). Use of polylysine dendrimers in the prevention and management of acne-prone skin and acneic skin (U.S. Patent No. 12083157). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12083157
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile