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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12082435 B1

PDFFull Text
Date of Patent:
Sep. 03, 2024

Filed:

Jul. 31, 2023

Display device and method of manufacturing display device

Applicant:

Samsung Display Co., Ltd., Yongin-si, KR;

Inventors:

Jaeseol Cho, Seoul, KR;

Chungi You, Asan-si, KR;

Assignee:

Samsung Display Co., Ltd., Yongin-si, KR;

Attorney:

Lewis Roca Rothgerber Christie LLP

Primary Examiner:

Michael Lebentritt

Int. Cl.
CPC ...
H10K 50/818 (2023.01); H10K 59/124 (2023.01); H10K 59/131 (2023.01); H10K 71/00 (2023.01); H10K 59/12 (2023.01); H10K 59/126 (2023.01); H10K 102/00 (2023.01);
U.S. Cl.
CPC ...
H10K 50/818 (2023.02); H10K 59/124 (2023.02); H10K 59/131 (2023.02); H10K 71/00 (2023.02); H10K 71/621 (2023.02); H10K 59/1201 (2023.02); H10K 59/126 (2023.02); H10K 2102/3026 (2023.02);
Abstract

A display device includes a substrate including a display area and a pad area, a lower electrode, a light emitting layer, an upper electrode on the light emitting layer, and a pad electrode in the pad area. The lower electrode is in the display area, the lower electrode including a first electrode, a second electrode, and a third electrode. The first electrode has a first etching rate with respect to an etching process. The second electrode is on the first electrode. The second electrode has a second etching rate with respect to the etching process that is higher than the first etching rate. The third electrode is on the second electrode. The third electrode has a third etching rate with respect to the etching process that is lower than the second etching rate and higher than the first etching rate. The light emitting layer is over the first electrode.

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