The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 03, 2024
Filed:
Apr. 21, 2021
Applicants:
Lot Ces Co., Ltd., Osan-si, KR;
Lot Vacuum Co., Ltd., Osan-si, KR;
Inventors:
Assignees:
LOT CES CO., LTD., Osan-si, KR;
LOT VACUUM CO., LTD., Osan-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05H 1/46 (2006.01); H01J 37/32 (2006.01); H01Q 1/26 (2006.01); H05H 1/02 (2006.01);
U.S. Cl.
CPC ...
H05H 1/4652 (2021.05); H01J 37/3211 (2013.01); H01Q 1/26 (2013.01); H05H 1/02 (2013.01);
Abstract
According to the present invention, provided is an inductively coupled plasma reactor including: a reaction chamber configured to provide a plasma reaction space; a ferrite core arranged to surround the plasma reaction space; and an antenna coil formed by winding a strip-shaped wire structure on the ferrite core, wherein the wire structure includes a plurality of electrically conductive wires and a covering made of a flexible material and configured to surround the plurality of electrically conductive wires.