The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 03, 2024

Filed:

Feb. 27, 2024
Applicant:

Nanjing University, Nanjing, CN;

Inventors:

Hai Lu, Nanjing, CN;

Dong Zhou, Nanjing, CN;

Weizong Xu, Nanjing, CN;

Assignee:

NANJING UNIVERSITY, Nanjing, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 31/103 (2006.01); H01L 31/0224 (2006.01); H01L 31/0312 (2006.01); H01L 31/18 (2006.01);
U.S. Cl.
CPC ...
H01L 31/1037 (2013.01); H01L 31/022408 (2013.01); H01L 31/0312 (2013.01); H01L 31/1812 (2013.01);
Abstract

The present invention discloses a novel silicon carbide-based lateral PN junction extreme ultraviolet detector with enhanced detection performance based on selective-area ion implantation, including an N-type ohmic contact lower electrode, an N-type substrate and a lightly-doped epitaxial layer which are connected sequentially from bottom to top, where the lightly-doped epitaxial layer is an N-type lightly-doped epitaxial layer or a P-type lightly-doped epitaxial layer; in a case that the lightly-doped epitaxial layer is an N-type or P-type lightly-doped epitaxial layer, a P-type or N-type well region is formed on the surface of the N-type or P-type lightly-doped epitaxial layer through the selective-area ion implantation, a P-type or N-type ohmic contact upper electrode is arranged on the P-type or N-type well region, and the P-type or N-type ohmic contact upper electrode is provided with a metal conductive electrode along its periphery.


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