The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 03, 2024

Filed:

Apr. 01, 2020
Applicant:

Hamamatsu Photonics K.k., Hamamatsu, JP;

Inventors:

Akira Tashiro, Hamamatsu, JP;

Masahiro Kotani, Hamamatsu, JP;

Takayuki Ohmura, Hamamatsu, JP;

Assignee:

HAMAMATSU PHOTONICS K.K., Hamamatsu, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 49/04 (2006.01); H01J 49/00 (2006.01);
U.S. Cl.
CPC ...
H01J 49/0418 (2013.01); H01J 49/0031 (2013.01);
Abstract

A sample support is used for ionization of a sample. The sample support includes a film part having a first front surface and a first back surface, the film part being formed with a plurality of through-holes, and a support part defining a measurement region for ionizing the sample with respect to the film part and supporting the film part. The support part includes an inner portion having a second front surface and a second back surface, the film part being fixed to the inner portion, and an outer portion having a third front surface and a third back surface and extending along an outer edge of the inner portion. A difference generated between a position of the first front surface and a position of the third front surface in a thickness direction of the film part is smaller than a thickness of the film part.


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