The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 03, 2024

Filed:

Jul. 14, 2020
Applicant:

Soleras Advanced Coatings Bv, Deinze, BE;

Inventors:

Wilmert De Bosscher, Drongen, BE;

Ivan Van De Putte, Waregem, BE;

Niek Dewilde, Kruishoutem, BE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); C23C 14/34 (2006.01); C23C 14/35 (2006.01); C23C 14/50 (2006.01); H01J 37/34 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32752 (2013.01); C23C 14/3407 (2013.01); C23C 14/35 (2013.01); C23C 14/50 (2013.01); C23C 14/505 (2013.01); H01J 37/3405 (2013.01); H01J 37/347 (2013.01); H01J 2237/20214 (2013.01); H01J 2237/20221 (2013.01); H01J 2237/3323 (2013.01);
Abstract

A movement system is provided for moving a non-flat substrate across a sputter flux distribution without circumferentially exposing the non-flat substrate to the sputter flux distribution. The movement system is arranged for a first movement of translationally transporting the non-flat substrate along the sputter flux distribution, and a second movement of translating and/or rotating the non-flat substrate with respect to the sputter flux distribution.


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